Sensitive Couture for Interactive Garment Editing and Modeling

ACM Transaction on Graphics (Proceedings of SIGGRAPH 2011)

Nobuyuki Umetani         Danny M. Kaufman        Takeo Igarashi        Eitan Grinspun

Columbia University       University of Tokyo       JST ERATO  


Abstract: We present a novel interactive tool for garment design that enables, for the first time, interactive bidirectional editing between 2D patterns and 3D high-fidelity simulated draped forms. This provides a continuous, interactive, and natural design modality in which 2D and 3D representations are simultaneously visible and seamlessly maintain correspondence. Artists can now interactively edit 2D pattern designs and immediately obtain stable accurate feedback online, thus enabling rapid prototyping and an intuitive understanding of complex drape form.

paper:   pdf (41.8M)
movie:   mov (94.9M)
SC editing sequence:  mov (21.3M)
SC demo:   source code
author = {Nobuyuki Umetani and Danny M. Kaufman and Takeo Igarashi and Eitan Grinspun},
  title = {Sensitive Couture for Interactive Garment Editing and Modeling},
   journal = {ACM Transactions on Graphics (SIGGRAPH 2011)},
   year = {2011},
   volume = {30},
   number = {4}


This work was supported in part by the Funai Overseas Scholarship, the JSPS, the Sloan Foundation, the NSF (CAREER Award CCF-0643268, IIS-0916129), Adobe, ATI, Autodesk, Intel, mental images, Microsoft Research, NVIDIA, Side Effects Software, the Walt Disney Company, and Weta Digital.